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dc.contributor.authorS N, Vidhya-
dc.contributor.authorO N, Balasundaram-
dc.contributor.authorM, Chandramohan-
dc.date.accessioned2020-09-30T07:17:59Z-
dc.date.available2020-09-30T07:17:59Z-
dc.date.issued2015-02-
dc.identifier.issn1319-6103-
dc.identifier.urihttps://www.journals.elsevier.com/journal-of-saudi-chemical-society-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/1908-
dc.description.abstractGallium doped tin oxide (Ga doped SnO2) thin films have been coated on silica glass substrates at 400 _C by the spray pyrolysis technique. The relative various volumes of Ga precursor solution, 0.5, 1.0, 1.5 and 2.0 were mixed with Sn precursor solution. The structural, morphological and optical properties of Ga doped SnO2 thin films are investigated. SnO2 and Ga doped SnO2 films showed well defined structures and polycrystalline nature and they showed orthorhombic and monoclinic structures. The variations of the surface morphology were observed by SEM results. The elemental compositional analysis of the Ga doped SnO2 thin films were confirmed using EDAX analysis. The transmittance spectra of the Ga doped SnO2 films were measured and a variation in the average transmittance, which is about 65–75% for the Ga doped SnO2 films. Maximum band gap value of 3.70 eV is obtained for Ga doped SnO2.en_US
dc.language.isoenen_US
dc.publisherElsieveren_US
dc.subjectThin filmsen_US
dc.subjectSEMen_US
dc.subjectOptical propertiesen_US
dc.subjectElectrical propertiesen_US
dc.titleSTRUCTURAL AND OPTICAL INVESTIGATIONS OF GALLIUM DOPED TIN OXIDE THIN FILMS PREPARED BY SPRAY PYROLYSISen_US
dc.typeArticleen_US
Appears in Collections:International Journals



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