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dc.contributor.authorLavanya, M-
dc.contributor.authorThiruarul, D-
dc.contributor.authorRajesh, K B-
dc.contributor.authorMahadevan, G-
dc.contributor.authorDhayalan, Velauthapillai-
dc.contributor.authorJaroszewicz, Z-
dc.date.accessioned2023-11-27T04:59:36Z-
dc.date.available2023-11-27T04:59:36Z-
dc.date.issued2021-08-25-
dc.identifier.urihttps://link.springer.com/article/10.1007/s12596-021-00691-1-
dc.description.abstractEnergy flux density for higher-order cylindrical vector vortex (HCVV) beam focused through a dielectric interface is analyzed numerically based on vector diffraction theory. Numerical results shows variation in the direction of the energy flux or Poynting vector distribution both in transverse and longitudinal plane upon suitably tuning the topological charge and polarization order of HCVV beam. We also note that the strong reverse flow of energy occur at the centre of the focal plane for certain values of the topological charge and polarization order. These results may find potential applications in optical trapping and optical manipulations.en_US
dc.language.isoen_USen_US
dc.publisherSpringer Linken_US
dc.titleENERGY FLUX DENSITY FOR HIGHER-ORDER CYLINDRICAL VECTOR VORTEX BEAM TIGHTLY FOCUSED THROUGH A DIELECTRIC INTERFACEen_US
dc.typeArticleen_US
Appears in Collections:2.Article (55)



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